Chemical vapor deposition of ultra-thin molybdenum dioxide nanosheets

摘要

We report the growth of ultra-thin molybdenum dioxide nanosheets on SiO2/Si substrate via chemical vapor deposition using molybdenum trioxide and sublimated sulfur as precursors. The thicknesses of the obtained MoO2 nanosheets show notable dependence on the baking temperature of the sulfur precursor. At sulfur temperature of 90 degrees C, the obtained nanosheets can be 5.5 nm thin, more than one order of magnitude thinner than that previously reported, in a narrow scatter ranging from 5.5 to 11.5 nm. Two-probe electrical measurements show that the as-prepared ultrathin MoO2 nanosheets preserve a high electrical conductivity of 3600 S/cm with thermal stability up to 200 degrees C. Above 250 degrees C, metallic MoO2 nanosheets are oxidized into insulating Mo03 flakes in air. (C) 2016 Elsevier B.V. All rights reserved.