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Evaluation of the photo-electro-catalytic behavior of nano-structured ZnO films fabricated by electrodeposition process

机译:电沉积工艺制备的纳米结构ZnO薄膜的光电催化性能评价

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摘要

Nanostructured ZnO thin films were synthesized on fluorinated tin oxide (PTO) substrate by electrodeposition process. The effect of applied voltage on the structure and photocatalytic behavior of the films was investigated. The deposition was conducted at different voltages of 0.5, 0.7, 0.9, and 1.1 V for 1000 s in an aqueous electrolyte containing both zinc nitrate hexahydrate (Zn(NO3)(2)center dot 6H(2)O) and sodium nitrate (NaNO3) at 70 degrees C. The morphology and elemental analysis of the ZnO films were investigated using scanning electron microscopy (SEM) and energy-dispersive X-ray spectroscopy (EDX), respectively. Photocatalytic behavior of the samples was evaluated by linear sweep voltammetry, amperometry, and electrochemical impedance tests under the ultraviolet light irradiation at a wavelength of 375 nm in a solution of sodium sulfate (Na2SO4). Results demonstrated that the film synthesized at 1.1 V showed the best photocatalytic behavior in comparison with the other samples. (C) 2016 Elsevier B.V. All rights reserved.
机译:通过电沉积法在氟化锡(PTO)衬底上合成了纳米结构的ZnO薄膜。研究了施加电压对薄膜结构和光催化性能的影响。在包含六水合硝酸锌(Zn(NO3)(2)中心点6H(2)O)和硝酸钠(NaNO3)的水性电解质中以0.5、0.7、0.9和1.1 V的不同电压进行沉积1000 s )在70摄氏度下进行。分别使用扫描电子显微镜(SEM)和能量色散X射线光谱(EDX)研究了ZnO膜的形貌和元素分析。样品的光催化行为通过线性扫描伏安法,安培法和电化学阻抗测试在硫酸钠(Na2SO4)溶液中于375 nm的紫外线照射下进行评估。结果表明,与其他样品相比,在1.1 V下合成的薄膜表现出最佳的光催化性能。 (C)2016 Elsevier B.V.保留所有权利。

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