首页> 外文期刊>Materials Chemistry and Physics >X-ray Diffraction Line Profile Analysis Of Nanocrystalline Graphite
【24h】

X-ray Diffraction Line Profile Analysis Of Nanocrystalline Graphite

机译:纳米晶石墨的X射线衍射线轮廓分析

获取原文
获取原文并翻译 | 示例
       

摘要

The structure evolution to nanocrystalline graphite produced by ball milling in n-dodecane has been studied by Fourier analysis of broadened X-ray diffraction line profiles according to double-Voigt method. The Fourier analysis gave size and strain distributions of the coherently diffracting domains (X-ray crystallite size) and root-mean-square-strain (rmss) and their average values. The precursor graphite was defined by average crystal sizes of about hundreds of nanometers, measured along the in-plane and out-of-plane directions, and low rmss value of 0.38 × 10~(-3). During milling, the average crystallite sizes of graphite decreased to about 6 and 43 nm along the out-of-plane and in-plane directions, respectively. Correspondingly, the rmss of milled graphite increased to 6.54 × 10~(-3). Analysis of the out-of-plane to in-plane crystallite size ratios showed that the crystallites became progressively thinner and flatter. A linear relationship between rmss and reciprocal crystallite size along the stacking axis revealed that size of disordered boundary regions gradually increased at the expense of ordered crystalline regions. A model describing crystalline-nanocrystalline transformation of graphite along different crystallographic axis was formulated and used to discuss the experimental data. It was concluded that a distortion-controlled process is responsible for the crystalline-nanocrystalline transformation of graphite milled in n-dodecane.
机译:通过双Voigt方法对宽的X射线衍射谱线进行傅里叶分析,研究了正十二烷球磨制纳米晶体石墨的结构演变。傅里叶分析给出了相干衍射域的尺寸和应变分布(X射线微晶尺寸)和均方根应变(均方根值)及其平均值。前驱体石墨由沿面内和面外方向测得的约数百纳米的平均晶体尺寸和0.38×10〜(-3)的低均方根值定义。在研磨过程中,石墨的平均微晶尺寸分别沿面外和面内方向减小到约6和43 nm。相应地,研磨后的石墨的均方根值增加到6.54×10〜(-3)。对面外与面内微晶尺寸比的分析表明,微晶逐渐变薄且变平。均方根值和沿堆叠轴的倒数晶体尺寸之间的线性关系表明,无序边界区域的尺寸逐渐增加,但有序晶体区域却以牺牲为代价。建立了描述石墨沿不同结晶轴的晶体-纳米晶体转变的模型,并用于讨论实验数据。结论是,在正十二烷中研磨的石墨,其形变受控过程是石墨的结晶-纳米晶转变的原因。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号