首页> 外文期刊>Materials Chemistry and Physics >Synthesis, characterization, photoluminescence and field emission properties of novel durian-like gallium nitride microstructures
【24h】

Synthesis, characterization, photoluminescence and field emission properties of novel durian-like gallium nitride microstructures

机译:新型榴莲状氮化镓微结构的合成,表征,光致发光和场发射特性

获取原文
获取原文并翻译 | 示例
       

摘要

Durian-like gallium nitride (GaN) microstructures were successfully synthesized on Si substrate by pre-treating Ga metal with aqueous NH_3 via catalyst assisted chemical vapor deposition (CVD) method at 1200℃. The as-synthesized product was characterized by X-ray diffraction (XRD), scanning electron microscopy (SEM) and energy dispersive X-ray spectroscopy (EDX). XRD and EDX analysis revealed that durian-like GaN is pure and single phase. SEM results showed that the size of the durian-like GaN structures was 20-25 μm. GaN microstructures exhibited reasonable field emission properties with the turn-onfieldof8.24Vμm~(-1) (0.01 mAcm~(-2))and threshold field of 10.18Vμm~(-1) (1 mA cm~(-2)) which is sufficient for applications of electron emission devices, field emission displays and vacuum micro-electronic devices. Photoluminescence (PL) properties of durian-like GaN studied at room temperature showed a strong near-band-edge emission at 369.4 nm (3.36 eV) whereas at low temperature it showed near-band-edge emission at 364.2 nm (3.4 eV) without yellow band emissions. The photoluminescence properties showed that it has also potential application in light-emitting devices.
机译:在1200℃的催化辅助化学气相沉积法(CVD)下,用NH_3水溶液对Ga金属进行预处理,在Si衬底上成功合成了榴莲状的氮化镓(GaN)微观结构。合成后的产物通过X射线衍射(XRD),扫描电子显微镜(SEM)和能量色散X射线光谱(EDX)进行表征。 XRD和EDX分析表明,类似榴莲的GaN是纯单相的。 SEM结果表明,榴莲状GaN结构的尺寸为20-25μm。 GaN微结构具有合理的场发射特性,其开启场为8.24Vμm〜(-1)(0.01 mAcm〜(-2)),阈值场为10.18Vμm〜(-1)(1 mA cm〜(-2))足够用于电子发射设备,场发射显示器和真空微电子设备。在室温下研究的榴莲状GaN的光致发光(PL)性能显示出在369.4 nm(3.36 eV)处有很强的近带边缘发射,而在低温下它没有显示在364.2 nm(3.4 eV)处有近带边缘发射。黄带发射。光致发光特性表明它在发光器件中也具有潜在的应用。

著录项

  • 来源
    《Materials Chemistry and Physics》 |2012年第3期|793-798|共6页
  • 作者单位

    Research Centre of Materials Science, Beijing Institute of Technology, Beijing 100081, People's Republic of China;

    Research Centre of Materials Science, Beijing Institute of Technology, Beijing 100081, People's Republic of China;

    Research Centre of Materials Science, Beijing Institute of Technology, Beijing 100081, People's Republic of China;

    Research Centre of Materials Science, Beijing Institute of Technology, Beijing 100081, People's Republic of China;

    Research Centre of Materials Science, Beijing Institute of Technology, Beijing 100081, People's Republic of China;

    Research Centre of Materials Science, Beijing Institute of Technology, Beijing 100081, People's Republic of China;

    Physics Department, Gomal University, D.I. Khan, Khyber-Pakhtunkhwa, Pakistan;

    Key Laboratory of Luminescence and Optical Information, Beijingjiaotong University, Ministry of Education, Beijing 700044, People's Republic of China;

    Key Laboratory of Luminescence and Optical Information, Beijingjiaotong University, Ministry of Education, Beijing 700044, People's Republic of China;

    State Key Laboratory for Mesoscopic Physics and Electron Microscopy Laboratory, School of Physics, Peking University, Beijing 100871, People's Republic of China;

    State Key Laboratory for Mesoscopic Physics and Electron Microscopy Laboratory, School of Physics, Peking University, Beijing 100871, People's Republic of China;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    semiconductor; CVD method; optical properties; field emission;

    机译:半导体;CVD法光学性质场发射;
  • 入库时间 2022-08-18 00:39:40

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号