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In situ formation of SiC-Si2ON2 micro-composite materials from preceramic polymers

机译:由陶瓷前体聚合物原位形成SiC-Si2ON2微复合材料

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Si-filler-loaded poly(methylsilsesquioxane) was pyrolyzed in nitrogen atmosphere between 1250 and 1600degreesC to fabricate Si-O-C-N micro-composite materials. The evolution of the microstructure and the resulting nanocomposition were studied by X-ray diffraction, scanning electron microscopy (SEM), high-voltage electron microscopy, high-resolution electron microscopy, electron energy-loss spectroscopy (esp. energy-loss near-edge structures), and porosity analysis. At pyrolysis temperatures below the melting point of Si (1414 degreesC) the silicon oxynitride (Si2ON2) formation proceeds via a vapor phase reaction between SiO and N-2 in the pores and results in fiber-like aggregates with distinct core-shell structures containing nanocrystalline regions. At higher temperatures the molten Si filler is involved in the silicon oxynitride formation reactions, and above 1500degreesC a complete conversion of the Si filler and the Si-C-O matrix into Si2ON2 takes place with a significant reduction of the porosity in comparison to the gas phase reaction regime. (C) 2003 Elsevier Science B.V. All rights reserved. [References: 30]
机译:将载有硅填料的聚(甲基倍半硅氧烷)在氮气氛中于1250至1600摄氏度之间热解,以制备Si-O-C-N微复合材料。通过X射线衍射,扫描电子显微镜(SEM),高压电子显微镜,高分辨率电子显微镜,电子能量损失谱(特别是近边缘的能量损失谱)研究了微观结构的演变和所得的纳米组成结构)和孔隙率分析。在低于硅熔点(1414摄氏度)的热解温度下,氮氧化硅(Si2ON2)的形成通过孔中SiO和N-2之间的气相反应进行,并导致纤维状聚集体具有明显的核壳结构,其中包含纳米晶体地区。在较高的温度下,熔融的硅填料参与氧氮化硅的形成反应,并且在1500℃以上,与气相反应相比,硅填料和Si-CO基体完全转化为Si2ON2,孔隙率显着降低。政权。 (C)2003 Elsevier Science B.V.保留所有权利。 [参考:30]

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