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The effects of neutron transmutations on the low-temperature dielectric properties of solid tantalum capacitors

机译:中子变质对固体钽电容器低温介电性能的影响

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The method of neutron transmutation doping (NTD) was used to modify the composition of the tantalum pentoxide (Ta2O5) dielectric of commercial solid tantalum electrolytic capacitors. The dielectric properties of these isotopically engineered capacitors were measured in the temperature range 90-300 K. Neutron irradiation periods of 30 and 120 days resulted in shifts in the capacitance-temperature and dielectric loss-temperature profiles with increasing irradiation dose. The 10 muF 35 V rated tantalum capacitors showed a good radiation hardness. (C) 2002 Elsevier Science B.V. All rights reserved. [References: 23]
机译:采用中子trans杂掺杂(NTD)方法对商用固体钽电解电容器中五氧化二钽(Ta2O5)电介质的组成进行了改性。在90-300 K的温度范围内测量了这些同位素工程电容器的介电性能。中子辐照时间为30天和120天导致电容-温度和介电损耗-温度曲线随辐照剂量的增加而变化。 10μF35 V额定钽电容显示出良好的辐射硬度。 (C)2002 Elsevier Science B.V.保留所有权利。 [参考:23]

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