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Chemical deposition of thallium doped cadmium selenide thin films and their characterization

机译:do掺杂硒化镉薄膜的化学沉积及其表征

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Systematic studies have been undertaken to investigate the effect of Tl doping on thin film properties of chemically deposited CdSe. Thin films of CdSe and doped CdSe with Tl ions were obtained by a chemical deposition technique in alkaline medium at 60degreesC. The films were characterized by using X-ray diffraction (XRD), scanning electron microscope (SEM), optical absorption, electrical conductivity and thermoelectric techniques. The studies revealed that pure and Tl doped CdSe films are polycrystalline in cubic structure. A decrease in electrical resistivity and optical bandgap are observed as Tl3+ doping concentration increases to 0.07 mol%. The optical transition is found to be of direct "allowed" type. The thermoelectric power measurements showed n type conduction mechanism for all doped samples. It is proposed that Tl3+ dissolves substitutionally in CdSe lattice in lower concentration range. (C) 2002 Published by Elsevier Science B.V. [References: 28]
机译:已经进行了系统研究来研究T1掺杂对化学沉积的CdSe的薄膜性质的影响。通过化学沉积技术在60℃的碱性介质中获得CdSe和掺杂Tl离子的CdSe薄膜。通过使用X射线衍射(XRD),扫描电子显微镜(SEM),光吸收,电导率和热电技术对薄膜进行表征。研究表明,纯的和T1掺杂的CdSe薄膜是立方结构的多晶。随着Tl3 +掺杂浓度增加到0.07 mol%,电阻率和带隙减小。发现光学跃迁是直接的“允许”类型。热电功率测量显示所有掺杂样品的n型传导机制。提出在较低浓度范围内,Tl3 +可替代地溶解在CdSe晶格中。 (C)2002由Elsevier Science B.V.发布[参考:28]

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