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Structural, dielectric and optical properties of highly oriented lead zirconate thin films prepared by sol-gel process

机译:溶胶凝胶法制备高取向锆酸铅薄膜的结构,介电和光学性质

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Lead zirconate (PbZrO3) thin films grown on Pt(1 1 1)/Ti/SiO2/Si(1 0 0) and fused quartz substrates are prepared by a sol-gel process. These films on Pt/Ti/SiO2/Si and fused quartz substrates have a highly (1 0 0), and random oriented growth, respectively. The crystallization mechanism of PbZrO3 film grown on various substrates is discussed. The PbZrO3 film on Pt/Ti/SiO2/Si substrate shows a typical antiferroelectric characteristic including the electric field induced reversible antiferroelectric-fetroelectric (AFE-FE) transition. The AFE-FE transition field was about 250 kV/cm and the reverse ferroelectric-antiferroelectric (FE-AFE) was about 125 kV/cm. For ferroelectric phase, the remanent polarization (P-r) and the coercive electric field (E-c) are 32 muC/cm(2) and 84 kV/em at applied voltage of 10 V, respectively. The thin films on fused quartz substrates exhibited good optical transmittance, and had optical direct transitions. The band gaps of the films, which annealed at 450, 600, and 750degreesC are 4.11, 4.56, and 4.59 eV, respectively. (C) 2002 Elsevier Science B.V. All rights reserved. [References: 32]
机译:通过溶胶-凝胶工艺制备了在Pt(1 1 1)/ Ti / SiO2 / Si(1 0 0)和熔融石英衬底上生长的锆酸铅(PbZrO3)薄膜。在Pt / Ti / SiO2 / Si和熔融石英衬底上的这些膜分别具有高度(1 0 0)和随机取向的生长。讨论了在各种衬底上生长的PbZrO3薄膜的结晶机理。 Pt / Ti / SiO2 / Si衬底上的PbZrO3膜显示出典型的反铁电特性,包括电场诱导的可逆反铁电-铁电(AFE-FE)跃迁。 AFE-FE跃迁场约为250 kV / cm,反向铁电-反铁电(FE-AFE)约为125 kV / cm。对于铁电相,在施加10 V电压时,剩余极化(P-r)和矫顽电场(E-c)分别为32μC/ cm(2)和84 kV / em。熔融石英衬底上的薄膜表现出良好的光学透射率,并具有光学直接跃迁。在450、600和750℃退火的薄膜的带隙分别为4.11、4.56和4.59 eV。 (C)2002 Elsevier Science B.V.保留所有权利。 [参考:32]

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