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Selectrion of materials for use at temperatures above 1500 deg.C in oxidizing atmospheres

机译:选择在氧化气氛中高于1500摄氏度的温度下使用的材料

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摘要

the purpose of this work was to select materials for applications in oxidizing atmospheres at temperatures of minimum of 1500 deg.C. several requirements had to be fulfilled, e.g. long-term oxidation resistance, low vapour pressure, creep resistance and low gas permeability. Another important point was to avoid reactions and sintering in material combinations with silica forming materials. The investigation was based on a detailed literature screening, followed by compatibility tests at 1600 deg.C in air with potential materials (Al_2O_3, ZrO_2, CeO_2, La_2O_3, Y_2O_3, HfO_2, MgO.Al_2O_3) and MoSi_2 as an example of a silica-forming material.
机译:这项工作的目的是选择用于温度至少为1500℃的氧化气氛中的材料。必须满足几个要求,例如长期抗氧化性,低蒸气压,抗蠕变性和低透气性。另一重要点是避免与二氧化硅形成材料的材料组合中发生反应和烧结。该调查基于详细的文献筛选,然后在1600摄氏度的空气中与潜在材料(Al_2O_3,ZrO_2,CeO_2,La_2O_3,Y_2O_3,HfO_2,MgO.Al_2O_3)和MoSi_2(作为二氧化硅-成型材料。

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