Investigation on Strain Films in the Thin Film Resistance Strain Gauge

Rongfa Chen; Dunwen Zuo; Yuli Sun; Duosheng Li; Wenzhuang Lu; Min Wang

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Investigation on Strain Films in the Thin Film Resistance Strain Gauge

机译：薄膜电阻应变计中应变膜的研究

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Strain films in the thin film resistance strain gauge are prepared by magnetron sputtering method. Some results concerning the electromechanical and structural properties of nichrome (Ni80Cr20 wt.%) thin films are presented. As compared to the well-known

机译：薄膜电阻应变计中的应变膜是通过磁控溅射法制备的。提出了一些有关镍铬合金（Ni80Cr20 wt。％）薄膜的机电性能和结构性能的结果。与知名度相比

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来源
《Key Engineering Materials》 |2008年第2008期|p.690-694|共5页
作者
Rongfa Chen; Dunwen Zuo; Yuli Sun; Duosheng Li; Wenzhuang Lu; Min Wang;
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作者单位

Department of Mechanical and Electrical Engineering, Nanjing University of Aeronautics and Astronautics, Nanjing, China, 210016;

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原文格式 PDF
正文语种 eng
中图分类工程基础科学;
关键词
nichrome thin film; thin film resistance strain gauge; electromechanical properties;

机译：镍铬薄膜;薄膜电阻应变计;机电性能;

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Investigation on Strain Films in the Thin Film Resistance Strain Gauge

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