首页> 外文期刊>Journal of Vacuum Science & Technology. B, Microelectronics and Nanometer Structures >High field-emission current of carbon nanotubes grown on TiN-coated Ta substrate for electron emitters in a microwave power amplifier
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High field-emission current of carbon nanotubes grown on TiN-coated Ta substrate for electron emitters in a microwave power amplifier

机译:微波功率放大器中生长在用于电子发射器的TiN涂层Ta衬底上的碳纳米管的高场发射电流

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摘要

For field emitters as an electron source of traveling wave tube microwave power amplifiers, field-emission properties of multiwalled carbon nanotubes (MWNTs) grown in situ onto an electrically conducting substrate were systematically characterized. MWNTs grown on a TiN-coated Ta substrate with NH3 plasma pre-treatment exhibited the best field-emission property. The maximum current density and corresponding total emission current were 9.4 mA/cm(2) and similar to5 mA at 18.8 V/mum, respectively. These enhanced field-emission properties are caused by the highly conducting buffer layer (TiN), the optimum metal substrate (Ta) that produces high field-emission current, and the control of site density of MWNTs by NH3 plasma pre-etching. Details on the correlation between the field-emission properties and the morphological parameters will be discussed. (C) 2004 American Vacuum Society.
机译:对于作为行波管微波功率放大器电子源的场发射器,系统地表征了原位生长在导电衬底上的多壁碳纳米管(MWNT)的场发射特性。在经过NH3等离子体预处理的TiN涂层Ta衬底上生长的MWNT表现出最佳的场发射性能。最大电流密度和相应的总发射电流分别为9.4 mA / cm(2)和在18.8 V / mm时接近5 mA。这些增强的场发射特性是由高导电性缓冲层(TiN),产生高场发射电流的最佳金属基板(Ta)以及通过NH3等离子体预蚀刻控制MWNT的位点密度引起的。将讨论场发射特性与形态参数之间的相关性的细节。 (C)2004年美国真空学会。

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