首页> 外文期刊>Journal of Vacuum Science & Technology. B, Microelectronics and Nanometer Structures >Nanoscale current transport in epitaxial SrTiO3 on n(+)-Si investigated with conductive atomic force microscopy
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Nanoscale current transport in epitaxial SrTiO3 on n(+)-Si investigated with conductive atomic force microscopy

机译:导电原子力显微镜研究n(+)-Si上外延SrTiO3中的纳米电流传输

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We have used conductive atomic force microscopy to image the nanoscale current distribution in SrTiO3 grown epitaxially on n(+)-Si by molecular beam epitaxy. Topographic and current images were obtained simultaneously in contact mode with a bias voltage applied to the sample. Topographic images show a flat surface with a roughness of about 0.5 nm. Current images show small areas with local current flow on the order of pA for voltages larger than similar to2 V in forward bias and larger than similar to4 V in reverse bias. Histograms of the magnitude of the electrical current show a relatively narrow log-normal distribution, suggesting a common current mechanism with a Gaussian distribution in a parameter on which the current depends exponentially. Analysis of current images and histograms over a range of bias voltages suggests thermionic emission as the dominant current mechanism, rather than conduction associated with localized defects such as pin-holes, threading dislocations or grain boundaries. The analysis yields a barrier height of similar to0.5-0.6 eV with and a relative dielectric constant of 5-15, which is in reasonable agreement with previous reports using a dead layer model. (C) 2004 American Vacuum Society.
机译:我们已经使用导电原子力显微镜对通过分子束外延在n(+)-Si上外延生长的SrTiO3中的纳米级电流分布进行成像。在接触模式下同时将偏压施加到样品上,同时获得地形图和当前图像。形貌图像显示具有约0.5 nm粗糙度的平坦表面。电流图像显示的小区域中,局部电流流过pA量级,其电压大于正向偏压下类似于2 V,反向偏压大于类似下4V。电流大小的直方图显示相对较窄的对数正态分布,这表明在电流呈指数依赖的参数中,具有高斯分布的常见电流机制。对一系列偏置电压上的电流图像和直方图的分析表明,热电子发射是主要的电流机制,而不是与局部缺陷(如针孔,螺纹位错或晶界)相关的传导。分析得出的势垒高度接近0.5-0.6 eV,相对介电常数为5-15,与先前的使用死层模型的报告相吻合。 (C)2004年美国真空学会。

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