Photocontrolled Microphase Separation of Block Copolymers in Two Dimensions

摘要

Microphase separation(nanostructure formation)by block copolymers in thin films has been a subject of intensive study from interest in phenomenological aspects of self-assembly in a confined state.From practical viewpoints,such nanostructures also have been receiving considerable attention for fabrication of even smaller feature sizes than those obtained by the photolithography process.They have potential applications for high-density data storage media,for ultrafine filters or membranes,as templates for metal nanowires,and so forth.