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Flexible Low-Voltage Organic Thin-Film Transistors Enabled by Low-Temperature, Ambient Solution-Processable Inorganic/Organic Hybrid Gate Dielectrics

机译:低温,环境溶液可加工的无机/有机混合栅极电介质实现的柔性低压有机薄膜晶体管

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摘要

We report here on the design, synthesis, processing, and dielectric properties of novel cross-linked inorganic/organic hybrid blend (CHB) dielectric films which enable low-voltage organic thin-film transistor (OTFT) operation. CHB thin films (20-43 nm thick) are readily fabricated by spin-coating a zirconium chloride precursor plus an α,ω-disilylalkane cross-linker solution in ambient conditions, followed by curing at low temperatures (~150 ℃). The very smooth CHB dielectrics exhibit excellent insulating properties (leakage current densities ~10~(-7) A/cm~2), tunable capacitance (95-365 nF/cm~2), and high dielectric constants (5.0-10.2). OTFTs fabricated with pentacene as the organic semiconductor function well at low voltages (<- 4.0 V). The morphologies and microstructures of representative semiconductor films grown on CHB dielectrics prepared with incrementally varied compositions and processing conditions are investigated and shown to correlate closely with the OTFT response.
机译:我们在这里报告新型交联的无机/有机杂化共混物(CHB)介电膜的设计,合成,加工和介电性能,这些介电膜可实现低压有机薄膜晶体管(OTFT)操作。通过在环境条件下旋涂氯化锆前体和α,ω-二甲硅烷基烷烃交联剂溶液,然后在低温(〜150℃)下固化,可以轻松制得CHB薄膜(厚20-43 nm)。非常光滑的CHB电介质具有优异的绝缘性能(漏电流密度〜10〜(-7)A / cm〜2),可调电容(95-365 nF / cm〜2)和高介电常数(5.0-10.2)。用并五苯作为有机半导体制造的OTFT在低压(<-4.0 V)下表现良好。研究了在CHB电介质上生长的具有代表性的半导体膜的形貌和微观结构,这些膜以逐渐变化的成分和加工条件制备,并显示出与OTFT响应密切相关。

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  • 来源
    《Journal of the American Chemical Society》 |2010年第49期|p.17426-17434|共9页
  • 作者单位

    Department of Chemistry and Materials Research Center, Northwestern University, 2145 Sheridan Road, Evanston, Illinois 60208 United States;

    Department of Chemistry and Materials Research Center, Northwestern University, 2145 Sheridan Road, Evanston, Illinois 60208 United States,Korea Research Institute of Chemical Technology, 19 Sinseongno, Yuseong, Daejeon 305-600 (Korea);

    Department of Material Science Engineering, and Materials Research Center, Northwestern University, 2145 Sheridan Road, Evanston, Illinois 60208 United States;

    Department of Chemistry and Materials Research Center, Northwestern University, 2145 Sheridan Road, Evanston, Illinois 60208 United States;

    Department of Material Science Engineering, and Materials Research Center, Northwestern University, 2145 Sheridan Road, Evanston, Illinois 60208 United States;

    Department of Chemistry and Materials Research Center, Northwestern University, 2145 Sheridan Road, Evanston, Illinois 60208 United States;

    Department of Chemistry and Materials Research Center, Northwestern University, 2145 Sheridan Road, Evanston, Illinois 60208 United States,Department of Material Science Engineering, and Materials Research Center, Northwestern University, 2145 Sheridan Road, Evanston, Illinois 60208 United States;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);美国《化学文摘》(CA);
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  • 正文语种 eng
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