A Direct Measurement of Wave Resistance by the Measurement of Wave Height on a Surface Patch

摘要

This paper explains a new procedure for the direct measurement of wave resistance from the measurement of ship-wave height on a patch of surface water near the hull. The optical instrumentation used and the newly developed method for numerical calculations are explained. Internal consistency tests and a comparison with well-known longitudinal wave height cut methods, LCM, are provided. This numerical procedure does not require any truncation correction and uses all of the data collected by an optical system described in the paper. This procedure could be more attractive to narrower tanks, as the requirement for tank beam to model length ratio for successful truncation correction b/L > 5 is removed. This formulation can also be used in connection with data collected by a series of wave probe records.