The impact of etching during microfabrication on the microstructure and the electrical conductivity of gadolinia-doped ceria thin films

摘要

Gadolinia-doped ceria, Ce_(0.8)Gd_(0.2)O_(1.9-x) (CGO), thin films deposited by spray pyrolysis and annealed to different degree of crystallinity between 0% and 95% are exposed to different etchants and etching methods. The attack of the etchants on the CGO thin films is analyzed with respect to changes in microstructure and in-plane electrical conductivity. It is found that amorphous CGO films are dissolved in hydrochloric acid after elongated etching times. Hydrofluoric acid severely attacks CGO thin films after already short times of exposure (1 min), more intense the less crystalline the thin film is. Ar ion etching smoothens the surface of the CGO thin films without considerable removal of material. No microstructural attack of NaOH, CHF_3/O_2 and SF_6/Ar is found. The electrical conductivity is in general only affected when microstructural changes are severe. Therefore, it is concluded that CGO thin films can be well used as functional layers in micro-fabricated devices and that micro-fabrication is, with the exception of hydrofluoric, not harmful for the electrical properties of crystalline CGO thin films.