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Effect of ammoniating temperature on microstructure of one-dimensional GaN nanorods with Tb intermediate layer

机译:氨化温度对带有Tb中间层的一维GaN纳米棒微观结构的影响

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摘要

GaN nanorods have been successfully synthesized on Si (111) substrates by magnetron sputtering through ammoniating Ga_2O_3/Tb thin films. The influence of ammonating temperatures on microstructure, morphology and light emitting properties of GaN nanorods was ananlyzed in detail using X-ray diffraction, X-ray photo-electron spectroscopy, FT-IR spectrophotometer, scanning electron microscopy, high- resolution transmission electron microscopy, and photoluminescence spectroscopy. The results demonstrate that the GaN nanorods are single crystalline and exhibit hexagonal wurtzite symmetry. The highest crystalline quality was achieved at 950 ℃ for 15 min with the size of 100-150 nm in diameter, which have an excellent light emitting properties. A small red-shift occurs due to band-gap change caused by the tensile stress.
机译:通过氨化Ga_2O_3 / Tb薄膜,通过磁控溅射在SiC(111)衬底上成功地合成了GaN纳米棒。使用X射线衍射,X射线光电子能谱,FT-IR分光光度计,扫描电子显微镜,高分辨率透射电子显微镜详细分析了氨化温度对GaN纳米棒的微观结构,形态和发光性能的影响,和光致发光光谱。结果表明,GaN纳米棒是单晶的,并且具有六角纤锌矿对称性。在950℃下15min达到最高的结晶质量,直径为100-150 nm,具有优良的发光性能。由于拉应力引起的带隙变化,会发生小的红移。

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