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Fabrications of SnS thin films and SnS-based heterojunctions on flexible polyimide substrates

机译:在柔性聚酰亚胺衬底上制备SnS薄膜和SnS基异质结

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摘要

The flexible polyimide substrates were utilized to realize the flexibility of SnS thin films and SnS-based heterojunctions. The SnS thin films and ZnO/SnS heterojunctions were deposited on polyimide substrates by magnetron sputtering. The properties of SnS thin films and ZnO/SnS heterojunctions were studied. The experimental results show that the post annealing can enhance the degree of crystallinity of flexible SnS thin films. The annealed SnS thin films present polycrystalline structure with preferential orientation along the (040) plane and grain size of 18 nm. The compositions of as-deposited and annealed flexible SnS thin films are close to the stoichiometry of SnS. The direct band gaps are 1.48 and 1.32 eV for the as-deposited and annealed SnS thin films, respectively. The fabricated flexible ZnO/SnS heterojunctions show rectifying properties with the rectifying ratio of 6.85 and the diode ideal factor of 1.23. The experimental results indicate the feasibility of using polyimide as the substrates of SnS thin films and SnS-based heterojunctions.
机译:利用柔性聚酰亚胺衬底实现SnS薄膜和SnS基异质结的柔性。通过磁控溅射在聚酰亚胺衬底上沉积SnS薄膜和ZnO / SnS异质结。研究了SnS薄膜和ZnO / SnS异质结的性能。实验结果表明,后退火可以提高柔性SnS薄膜的结晶度。退火的SnS薄膜呈现多晶结构,其沿(040)平面优先取向,晶粒尺寸为18 nm。沉积和退火后的柔性SnS薄膜的组成接近于SnS的化学计量。沉积和退火后的SnS薄膜的直接带隙分别为1.48和1.32 eV。制备的柔性ZnO / SnS异质结具有整流特性,整流比为6.85,二极管理想因子为1.23。实验结果表明,使用聚酰亚胺作为SnS薄膜和SnS基异质结的衬底是可行的。

著录项

  • 来源
    《Journal of materials science》 |2014年第7期|3028-3033|共6页
  • 作者单位

    School of Materials and Energy, Guangdong University of Technology, Guangzhou 510006, China;

    School of Materials and Energy, Guangdong University of Technology, Guangzhou 510006, China;

    School of Materials and Energy, Guangdong University of Technology, Guangzhou 510006, China;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
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