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首页> 外文期刊>Journal of materials science >Synthesis, growth, crystal structure and characterization of new stilbazolium derivative single crystal: (E)-4-(3-ethoxy-2-hydroxystyryl)-1-methyl pyridinium iodide (3ETSI)
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Synthesis, growth, crystal structure and characterization of new stilbazolium derivative single crystal: (E)-4-(3-ethoxy-2-hydroxystyryl)-1-methyl pyridinium iodide (3ETSI)

机译:新型噻唑鎓衍生物单晶的合成,生长,晶体结构和表征:(E)-4-(3-乙氧基-2-羟基苯乙烯基)-1-甲基碘化吡啶鎓(3ETSI)

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摘要

Organic single crystals of new stilbazolium derivative, (E)-4-(3-ethoxy-2-hydroxystyryl)-l-methyl pyridinium iodide (3ETSI), was grown by slow evaporation technique. Single crystal X-ray diffraction study revealed that 3ETSI crystallizes in monoclinic crystal system with centrosymmetric space group P2_1/c. The characteristic functional groups of the grown crystal were identified by FT-IR spectral studies. The ~1H NMR spectral studies further confirm the molecular structure of the grown crystal. The thermal behaviour of 3ETSI crystal was studied by TG/ DSC analysis. The grown crystal was found to be transparent in the region between 471 and 800 nm as indicated by the UV-visible spectral studies. Photoluminescence spectrum of 3ETSI crystal shows broad green emission peak at 529 nm. The mechanical strength of the grown crystal was estimated by Vickers microhardness tester. The laser damage threshold of 3ETSI crystal was found to be 2.5 GW/cm~2 using Nd: YAG laser (1064 nm). Etching studies enunciate the two-dimensional (2D) layer growth mechanisms in the grown crystal. The third-order nonlinear optical properties including nonlinear refractive index (n_2), nonlinear absorption coefficient (β), and third-order nonlinear optical susceptibility (x~((3))) of 3ETSI crystal were investigated by the Z-scan technique using continuous wave (CW) He-Ne laser at 632.8 nm.
机译:通过缓慢蒸发技术生长了新的噻唑鎓衍生物(E)-4-(3-乙氧基-2-羟基苯乙烯基)-1-甲基碘化吡啶鎓(3ETSI)的有机单晶。 X射线单晶衍射研究表明3ETSI在具有中心对称空间群P2_1 / c的单斜晶体系统中结晶。通过FT-IR光谱研究鉴定了生长晶体的特征官能团。 〜1H NMR光谱研究进一步证实了所生长晶体的分子结构。通过TG / DSC分析研究了3ETSI晶体的热行为。如UV-可见光谱研究所示,发现生长的晶体在471至800nm之间的区域中是透明的。 3ETSI晶体的光致发光光谱在529 nm处显示宽的绿色发射峰。生长的晶体的机械强度通过维氏显微硬度测试仪估计。使用Nd:YAG激光(1064 nm)发现3ETSI晶体的激光损伤阈值为2.5 GW / cm〜2。蚀刻研究阐明了晶体生长中的二维(2D)层生长机理。利用Z扫描技术,研究了3ETSI晶体的三阶非线性光学性质,包括非线性折射率(n_2),非线性吸收系数(β)和三阶非线性光学磁化率(x〜((3)))。 632.8 nm的连续波(CW)He-Ne激光器。

著录项

  • 来源
    《Journal of materials science 》 |2017年第12期| 8937-8949| 共13页
  • 作者单位

    Centre for Crystal Growth, VIT University, Vellore 632 014, India;

    Centre for Crystal Growth, VIT University, Vellore 632 014, India;

    Centre for Crystal Growth, VIT University, Vellore 632 014, India;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
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