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机译:HfO_2 / Co界面和Co / HfO_2界面对垂直Co / Pt多层膜中霍尔异常行为的影响
Department of Materials Science and Engineering, College of Engineering, Peking University, Beijing, China;
Department of Materials Physics and Chemistry, University of Science and Technology Beijing, Beijing, China;
Department of Materials Physics and Chemistry, University of Science and Technology Beijing, Beijing, China;
Department of Materials Physics and Chemistry, University of Science and Technology Beijing, Beijing, China;
Department of Materials Physics and Chemistry, University of Science and Technology Beijing, Beijing, China;
Department of Materials Physics and Chemistry, University of Science and Technology Beijing, Beijing, China;
Department of Materials Physics and Chemistry, University of Science and Technology Beijing, Beijing, China;
Anomalous Hall effect; Perpendicular Co/Pt multilayers; Thermal stability;
机译:Fe合金/ HfO_2界面处的强垂直磁各向异性能密度
机译:X射线光电子能谱法测定HfO_2 /多层MoS_2界面的能带排列:CHF_3处理的影响
机译:HfO2层夹在垂直Co / Pt多层膜中的热稳定霍尔行为
机译:HfO_2和HfO_2 / Si界面在200cm〜(-1)至2000cm〜(-1)范围内的红外吸收研究
机译:磁性和界面散射对钴/钯多层膜中异常霍尔效应的贡献
机译:界面各向异性对垂直取向的硬/软交换耦合多层膜退磁过程的影响
机译:表面和界面散射对Co / Pd多层膜中异常霍尔效应的影响