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Melting of Krypton Layers Adsorbed in Cylindrical Pores

机译:圆柱孔中吸附的rypto层的熔化

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摘要

The mechanism of melting and its correlation to adsorption on cylindrical surfaces of silica-like cylindrical nanopores has been studied for the first time. The size of the pores has been defined by its diameter (4 nm in this work). As an example, we have analyzed krypton atoms as adsorbed system. We have shown, that the layer adsorbed on the surface of the pore has much lower melting temperature (T = 77.5 K) than both the filled pore (T = 90 K) and the bulk system (T = 118 K). The mechanism of melting in the layer is a continuous transition and depends on the vacancy formation. The layering transition changes its character with temperature from a sharp transition below the melting temperature into a continuous one above it.
机译:首次研究了熔融机制及其与二氧化硅样圆柱形纳米孔的圆柱形表面吸附的相关性。孔的大小由其直径(本研究中为4 nm)定义。例如,我们分析了k原子作为吸附系统。我们已经表明,吸附在孔表面上的层的熔融温度(T = 77.5 K)比填充孔(T = 90 K)和本体体系(T = 118 K)低得多。层中的熔化机理是连续的转变,取决于空位的形成。分层转变随温度的变化而从低于熔融温度的急剧转变转变为高于熔融温度的连续转变。

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  • 来源
    《Journal of Low Temperature Physics》 |2005年第6期|591-598|共8页
  • 作者

    B. Kuchta; L. Firlej;

  • 作者单位

    Laborat. des Matériaux Divises Revetement Electrocéramiques (MADIREL) Université de Provence Centre de Saint-Jérôme;

    Groupe de Dynamique des Phases Condensées (GDPC) Université Montpellier II;

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