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Advanced Characterization Techniques and Analysis of Thermal Properties of AlGaN/GaN Multifinger Power HEMTs on SiC Substrate Supported by Three-Dimensional Simulation

机译:三维模拟支持的SiC衬底上AlGaN / GaN多指功率HEMT的先进表征技术和热性能分析

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摘要

In this paper, several methods suitable for real time on-chip temperature measurements of power AlGaN/GaN-based high-electron mobility transistor (HEMT) grown on a SiC substrate are presented. The measurement of temperature distribution on HEMT surface using Raman spectroscopy is presented. The second approach utilizes electrical I-V characteristics of the Schottky diode neighboring to the heat source of the active transistor under different dissipated power for temperature measurement. These methods are further verified by measurements with microthermistors. The features and limitations of the proposed methods are discussed. The thermal parameters of materials used in the device are extracted from the temperature distribution in the structure with the support of three-dimensional thermal simulation of the device. Thermal analysis of the multifinger power HEMT is performed. The effects of the structure design and fabrication processes from semiconductor layers, metallization, and packaging up to cooling solutions are investigated. The influence of individual layer properties on the thermal performance of different HEMT structures under different operating conditions is presented. The results show that the proposed experimental methods supported by simulation have a potential for the design, analysis, and thermal management of HEMT.
机译:在本文中,提出了几种适合在SiC衬底上生长的功率AlGaN / GaN基高电子迁移率晶体管(HEMT)进行实时片上温度测量的方法。提出了使用拉曼光谱法测量HEMT表面温度分布的方法。第二种方法利用在不同耗散功率下与有源晶体管热源相邻的肖特基二极管的电I-V特性进行温度测量。这些方法通过微热敏电阻的测量进一步验证。讨论了所提出方法的特征和局限性。在设备的三维热模拟的支持下,从结构中的温度分布中提取设备中使用的材料的热参数。对多指电源HEMT进行热分析。研究了从半导体层,金属化,封装到冷却解决方案的结构设计和制造过程的影响。提出了在不同的操作条件下,各层性能对不同HEMT结构的热性能的影响。结果表明,所提出的实验方法得到了仿真的支持,对于HEMT的设计,分析和热管理具有潜在的潜力。

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