首页> 外文期刊>Journal of Electronic Materials >Oxygen Incorporation, Photoluminescence, and Laser Performance of AIGaAs Grown by Organometallic Vapor Phase Epitaxy
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Oxygen Incorporation, Photoluminescence, and Laser Performance of AIGaAs Grown by Organometallic Vapor Phase Epitaxy

机译:有机金属气相外延生长的AlGaAs的氧掺入,光致发光和激光性能

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摘要

Photoluminescence (PL) of separate confinement heterostructure, single quantum well (SCH-SQW) laser material provides a quantitative evaluation of the quality of AIGaAs grown by organometallic vapor phase epitaxy. There is a good correlation between the oxygen level in the quantum well confining layers measured by secondary ion mass spectroscopy, quantum well PL efficiency, and laser threshold current. When oxygen was reduced from 2.0 x 10~(18)cm~(-3) to 1.5 x 10~(17) cm~(-3), the PL intensity increased by a factor of 12, and the threshold current density was improved from 1300 to 240 A/cm~2 for a 100 x 600 μm device. Oxygen levels were decreased by using a higher growth rate, shorter interface pause time, higher Ⅴ/Ⅲ ratio, and an arsine purifier.
机译:单独的限制异质结构,单量子阱(SCH-SQW)激光材料的光致发光(PL)提供了对通过有机金属气相外延生长的AIGaAs的质量的定量评估。通过二次离子质谱法测量的量子阱限制层中的氧含量,量子阱PL效率和激光阈值电流之间具有良好的相关性。当氧气从2.0 x 10〜(18)cm〜(-3)减少到1.5 x 10〜(17)cm〜(-3)时,PL强度增加了12倍,阈值电流密度提高了对于100 x 600μm器件,从1300到240 A / cm〜2。通过使用较高的生长速率,较短的界面暂停时间,较高的Ⅴ/Ⅲ比值和砷化氢净化器,可以降低氧气含量。

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