首页> 外文期刊>Journal of Electronic Materials >Microstructure and Characteristics of Thin-Film La0.8Sr0.2Co0.5Ni0.5O3/ZnO:Al Heterocontact CO Sensors Prepared by RF Magnetron Sputtering
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Microstructure and Characteristics of Thin-Film La0.8Sr0.2Co0.5Ni0.5O3/ZnO:Al Heterocontact CO Sensors Prepared by RF Magnetron Sputtering

机译:薄膜La 0.8 Sr 0.2 Co 0.5 Ni 0.5 O 3 的组织和特性sub> / ZnO:Al射频磁控溅射制备的异质接触CO传感器

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摘要

Highly sensitive CO gas sensors based on heterocontacts of ZnO:Al on La0.8Sr0.2Co0.5Ni0.5O3 (LSCNO) were fabricated successfully. La0.8Sr0.2Co0.5Ni0.5O3 thin films were coated on (100) silicon wafers by a sol-gel method including the Pechini process followed by a spin-coating procedure. Then, ZnO:Al films prepared by radiofrequency (RF) magnetron sputtering at various oxygen partial pressures and deposited on as-deposited La0.8Sr0.2Co0.5Ni0.5O3 films were investigated. The results revealed that the CO sensing ability of the film prepared with the ratio of O2/Ar = 5/5 (ratio of volume flow rate) was the worst, owing to the highest (002) plane orientation in the ZnO:Al film. In contrast, the ZnO:Al film prepared with O2/Ar = 3/7 exhibited better CO sensitivity. Furthermore, all two-layer samples showed higher CO sensitivities than single-layer samples. The CO sensitivity of ZnO:Al/La0.8Sr0.2Co0.5Ni0.5O3 thin film was 45% for 500 ppm CO at a sensing temperature of 200°C.
机译:基于ZnO:Al在La 0.8 Sr 0.2 Co 0.5 Ni 0.5 O上的异质接触的高灵敏度CO气体传感器成功制作了 3 (LSCNO)。将La 0.8 Sr 0.2 Co 0.5 Ni 0.5 O 3 薄膜涂覆在(100)通过包括Pechini工艺的溶胶-凝胶法进行硅晶片,然后进行旋涂工艺。然后,在不同的氧分压下通过射频(RF)磁控溅射制备的ZnO:Al膜并沉积在沉积的La 0.8 Sr 0.2 Co 0.5 上研究了sub> Ni 0.5 O 3 薄膜。结果表明,以O 2 / Ar = 5/5(体积流量比)制备的薄膜的CO感测能力最差,这是由于(002)面最高ZnO:Al膜中的取向。相反,以O 2 / Ar = 3/7制备的ZnO:Al膜表现出更好的CO敏感性。此外,所有两层样品均显示出比单层样品更高的CO敏感性。 ZnO:Al / La 0.8 Sr 0.2 Co 0.5 Ni 0.5 O 3 <在200℃的感测温度下,对于500ppm CO,薄膜为45%。

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