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Electrodeposition of BixSb2−xTey Thermoelectric Films from DMSO Solution

机译:DMSO溶液电沉积Bi x Sb 2-x Te y 热电薄膜

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摘要

The electrochemical behavior of nonaqueous dimethyl sulfoxide solutions of BiIII, TeIV, and SbIII was investigated using cyclic voltammetry. On this basis, Bi x Sb2−x Te y thermoelectric films were prepared by the potentiodynamic electrodeposition technique in nonaqueous dimethyl sulfoxide solution, and the composition, structure, morphology, and thermoelectric properties of the films were analyzed. Bi x Sb2−x Te y thermoelectric films prepared under different potential ranges all possessed a smooth morphology. After annealing treatment at 200°C under N2 protection for 4 h, all deposited films showed p-type semiconductor properties, and their resistances all decreased to 0.04 Ω to 0.05 Ω. The Bi0.49Sb1.53Te2.98 thermoelectric film, which most closely approaches the stoichiometry of Bi0.5Sb1.5Te3, possessed the highest Seebeck coefficient (85 μV/K) and can be obtained under potentials of −200 mV to −400 mV.
机译:用循环伏安法研究了Bi III ,Te IV 和Sb III 的非水二甲基亚砜溶液的电化学行为。在此基础上,通过电位动态电沉积技术在非二甲基亚砜水溶液中制备了Bi x Sb 2-x Te y y热电薄膜,分析了膜的组成,结构,形态和热电性能。在不同电势范围下制备的Bi x Sb 2-x Te y 热电薄膜均具有光滑的形貌。在N 2 保护下于200°C退火处理4 h后,所有沉积膜均表现出p型半导体特性,其电阻均降低至0.04Ω至0.05Ω。 Bi 0.49 Sb 1.53 Te 2.98 热电薄膜,最接近Bi 0.5 Sb 1.5 Te 3 ,具有最高的塞贝克系数(85μV/ K),可在-200 mV至-400 mV的电势下获得。

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