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Strcutural and opticla characterization of InAs nanostructures grown on high-index InP substrates

机译:高折射率InP衬底上生长的InAs纳米结构的结构和光学表征

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摘要

The strucutral and optical properties of InAs layers grown on high-index InP surfaces by molecular beam epitaxy are investigated in order to understand the self-organizaiton of quantum dots and quantum wires on novel index surfaces. Four differnt InP substrate orientations have been examined, namely, (1 1 1)B, (3 1 1)A, and (3 1 1)B and (1 0 0). A rich variety of InAs nanostrucutres is formed on the surfaces. Quantum wire-liek morphology is observed on the (1 0 0) surface, and evident islanjd formaiton is found on (1 1 1)A and (3 1 1)B by atomic force microscopy. The phoitoluminescence specta of InP (1 1 1)A and (3 1 1)B samples show typicla QD features with PL peaks in the wavelength range 1.3-1.55 μm with comparable efficiency. These results suggest that the high-index substrates are promising candidates for production of hgih-quality self-organized QD materials for device applications.
机译:研究了通过分子束外延生长在高折射率InP表面上的InAs层的结构和光学性质,以了解新型折射率表面上量子点和量子线的自组织。已经检查了四个不同的InP衬底方向,即(1 1 1)B,(3 1 1)A,(3 1 1)B和(1 0 0)。表面上形成了多种InAs纳米结构。在(1 0 0)表面观察到量子线-鞘形态,通过原子力显微镜在(1 1 1)A和(3 1 1)B上发现明显的islanjd形式。 InP(1 1 1)A和(3 1 1)B样品的光致发光光谱显示出典型的QD特征,其PL峰位于1.3-1.55μm波长范围内,具有相当的效率。这些结果表明,高折射率基材是用于设备应用的高品质自组织QD材料生产的有前途的候选者。

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