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Some properites of heterostructures based on new semiconductor ZnCdHgTe

机译:基于新型半导体ZnCdHgTe的异质结构的一些性质

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Results of structural and electrical characteristics investigations performed for new heterostrucutres based on narrow-gpa semiconductor ZnCdHgTe have been reported. The epilayers p-Zn_xCd_yHg_1-x-yTe/pHg_0.8Cd_0.2 Te and p-Zn_xCd_yHg_1-x-yTe/P-Zn_0.04Cd_0.96Te (x=0.10-0.13, y=0.00-0.08) obtained by modified LPE technique of ZnCdHgTe films on subsrates of (1 1 1) orientation. The detailed Hall measuremetns showed the fromation of inverse conductivity type "channel-island" structure in subsyrface region of as-grown epilayer. The study of I-V characteristics in the temeprautre range 177-290 K at applied voltage V_a=0-4 V shows that the carrier transport processes are caused by the recombination of majority carriers tunneling form the bulk of Hg_0.8Cd_0.2Te substrate material with localized states in ZnCdHgTe and by the interaction of free carriers, and "potential relief" appeared as consequence of the conductivity inversion mentioned above.
机译:已经报道了对基于窄gpa半导体ZnCdHgTe的新型异质结构进行的结构和电气特性研究的结果。通过改良的LPE技术获得的外延层p-Zn_xCd_yHg_1-x-yTe / pHg_0.8Cd_0.2 Te和p-Zn_xCd_yHg_1-x-yTe / P-Zn_0.04Cd_0.96Te(x = 0.10-0.13,y = 0.00-0.08)基底(1 1 1)取向上的ZnCdHgTe薄膜的性质。详细的霍尔测量结果表明,在生长的外延层次表层区域反电导型“通道岛”结构的形成。研究在temeprautre范围177-290 K的外加电压V_a = 0-4 V时的IV特性,表明载流子的传输过程是由大多数载流子的复合形成的,这些载流子是从大部分Hg_0.8Cd_0.2Te衬底材料中局部化而形成的。 ZnCdHgTe中的自由状态和自由载流子的相互作用,由于上述电导率反转而出现“电位释放”。

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