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RHEED oscillation studies of pseudomorphic InGaAs strained layers on GaAs substrate

机译:GaAs衬底上准晶态InGaAs应变层的RHEED振荡研究

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We use reflection high-energy electron diffraction (RHEED) oscillations to study the substrate temperature and In/Ga flux ratio dependencies of the growth of pseudomorphic InGaAs layers on gas. The growth of InGaAs on GaAs shows strongly damped oscillations which is dependent on the substrate temperature. The In mole fradion dorps almost linearly with increasing substrate temperature above 580 deg C, wiht a dropping rate of 0.08-0.13/100/deg C which is dependent on IOn/Ga beam equivalent pressure (BEP) ratio. The In mole fraction drops almost linearly with decreasging substrate temperature below 500 deg C. The decrease bellow 500 deg C reported here is observed for the first time.
机译:我们使用反射高能电子衍射(RHEED)振荡来研究衬底温度以及InGaGa假生长在气体上的In / Ga通量比的依赖性。 InGaAs在GaAs上的生长显示出强烈衰减的振荡,这取决于衬底温度。铟基摩尔多普斯随着衬底温度在580摄氏度以上的升高而呈线性关系,下降速率为0.08-0.13 / 100 /摄氏度,这取决于IOn / Ga束当量压力(BEP)比率。 In摩尔分数随底物温度降低到500摄氏度以下而几乎呈线性下降。此处首次报道了此处降低的500摄氏度以下。

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