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Influence Of Growth Parameters On The Sub-bandgap Absorption Of Movpe-grown Gan Measured Using Photothermal Deflection Spectroscopy

机译:生长参数对Movpe生长的Gan子带隙吸收的光热偏转光谱测量

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In this work we have compared the sub-bandgap absorptance of nominally undoped GaN samples grown under different conditions. The absorptance is measured using standard transmission measurements and transverse photothermal deflection spectroscopy (PDS). The sub-bandgap absorptance is dominated by an exponential Urbach tail (3.0-3.42eV) and a defect absorptance (energy range < 3.0eV). By measuring the thickness dependence of the absorptance we show that the defect absorptance has both a surface and a bulk contribution. The defect absorptance decreases by capping the sample with a thin layer of AlGaN. This suggests that the capping layer passivates the contribution of the surface states to the defect absorptance. We show that sub-bandgap absorptance is a sensitive indicator of bulk and surface defects introduced due to changes in carrier gas purity, making it a valuable tool for characterization of nitride semiconductors.
机译:在这项工作中,我们比较了在不同条件下生长的标称未掺杂GaN样品的亚带隙吸收率。使用标准透射率测量和横向光热偏转光谱(PDS)测量吸收率。亚带隙吸收率主要由指数型Urbach尾巴(3.0-3.42eV)和缺陷吸收率(能量范围<3.0eV)决定。通过测量吸收率的厚度依赖性,我们表明缺陷吸收率既具有表面贡献又具有体积贡献。通过将样品覆盖一层薄的AlGaN可以降低缺陷吸收率。这表明覆盖层钝化了表面状态对缺陷吸收率的贡献。我们表明,由于带载气体纯度的变化,亚带隙吸收率是引入的大量缺陷和表面缺陷的敏感指标,这使其成为表征氮化物半导体的有价值的工具。

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