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Hydrogen Effects In Ⅲ-nitride Movpe

机译:Ⅲ族氮化物氢的氢效应

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Influence of hydrogen on the growth of Ⅲ-nitride materials by MOVPE is discussed using modeling and experimental study. The main conclusion, coming from the modeling and supported by numerous experimental observations, is that hydrogen affects the growth of Ⅲ-nitrides in two different ways: via layer etching at elevated temperatures and via surface coverage with metal adatoms. The adatoms are found to accumulate on the surface due to interaction with hydrogen in a wide temperature range, including reduced temperatures. With regard to these effects, one can control such important characteristics as layer composition, growth anisotropies, surface quality, and even material properties (like p-doping level) by adjusting the carrier gas composition and other growth parameters.
机译:通过建模和实验研究探讨了氢对MOVPE材料生长Ⅲ族氮化物的影响。来自模型的主要结论并得到众多实验观察的支持,主要结论是氢以两种不同方式影响Ⅲ型氮化物的生长:高温下的层刻蚀和金属原子的表面覆盖。由于在较宽的温度范围内,包括降低的温度下,与氢的相互作用,发现吸附原子积聚在表面上。关于这些效果,可以通过调整载气成分和其他生长参数来控制诸如层组成,生长各向异性,表面质量甚至材料特性(例如p掺杂水平)等重要特征。

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