Effects of substrate offset angles on MBE growth of ZnO

摘要

Effects of sapphire substrate offset angle on MBE growth of ZnO films were investigated. Twin crystal RHEED patterns and surface facetting observed with c-plane just-oriented substrates were suppressed by enlarging the offset angles from near-zero to 2.87 deg. Improvement in FWHM of XRC and surface morphology was observed with larger offset angles, indicating that the offset angle also is a sensitive factor for ZnO film growth.