首页> 外文期刊>Journal of Computational Electronics >An ab initio study of the structural and optoelectronic properties of Al_xGa_(1-x)N (x=0,0.125,0.375,0.625,0.875, and 1) semiconductors
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An ab initio study of the structural and optoelectronic properties of Al_xGa_(1-x)N (x=0,0.125,0.375,0.625,0.875, and 1) semiconductors

机译:从头开始研究Al_xGa_(1-x)N(x = 0,0.125,0.375,0.625,0.875和1)半导体的结构和光电性能

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The structural and optoelectronic properties of AlxGa1-xN (x = 0, 0.125, 0.375, 0.625, 0.875, and 1) semiconductors are studied in detail by applying the full-potential linearized augmented plane-wave method in density functional theory in WIEN2k software. The lattice parameter, the bulk modulus, and its pressure derivative are calculated using the Perdew-Burke-Ernzerhof generalized gradient approximation and by fitting the calculated total energy to the Murnaghan equation. These parameters are found to be in excellent agreement with experimental and theoretical results for both the GaN and AlN compounds. For the Al0.125Ga0.875N, Al0.375Ga0.625N, Al0.625Ga0.375N, and Al0.875Ga0.125N alloys, because of the lack of the theoretical and experimental data, our results can be considered as first predictions. The Tran-Blaha modified Becke-Johnson approach (TB-mBJ) is applied to determine the optoelectronic properties. The results demonstrate that GaN and the AlxGa1-xN alloys with x = 0.125, 0.375, 0.625, and 0.875 have a direct Gamma-Gamma bandgap, whereas the binary AlN compound has an indirect Gamma-X bandgap. Furthermore, the optical properties, such as the dielectric function, refractive index, reflectivity, absorption coefficient, and energy loss function, are presented and discussed in detail; their wide bandgap means that these compounds can be applied in optoelectronic devices for application in the main parts of the ultraviolet and visible spectrum.
机译:通过在WIEN2k软件中将全势线性化增强平面波方法应用于密度泛函理论,详细研究了AlxGa1-xN(x = 0、0.125、0.375、0.625、0.875和1)半导体的结构和光电性能。使用Perdew-Burke-Ernzerhof广义梯度近似并通过将计算的总能量拟合到Murnaghan方程,可以计算出晶格参数,体积模量及其压力导数。发现这些参数与GaN和AlN化合物的实验和理论结果都非常吻合。对于Al0.125Ga0.875N,Al0.375Ga0.625N,Al0.625Ga0.375N和Al0.875Ga0.125N合金,由于缺乏理论和实验数据,我们的结果可以被认为是第一个预测。 Tran-Blaha改进的Becke-Johnson方法(TB-mBJ)用于确定光电性能。结果表明,x = 0.125、0.375、0.625和0.875的GaN和AlxGa1-xN合金具有直接的Gamma-Gamma带隙,而二元AlN化合物具有间接的Gamma-X带隙。此外,还详细介绍了光学性质,如介电函数,折射率,反射率,吸收系数和能量损失函数,并进行了讨论。它们的宽带隙意味着这些化合物可用于光电器件中,以用于紫外线和可见光谱的主要部分。

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