The effects of deposition temperatures on the characteristics of nitrogenated carbon films deposited on p‐type silicon substrates by thermal chemical vapor deposition

著录项

• 来源
  《Journal of the Chinese Institute of Engineers》 |2010年第6期|p.891-897|共7页
• 作者

  Chia‐Ya Lina amp; Sham‐Tsong Shiueb*;

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• 作者单位

  a Department of Materials Science and Engineering, National Chung Hsing University, 250 Kuo Kuang Road, Taichung 402, Taiwan, R.O.C. b Department of Materials Science and Engineering, National Chung Hsing University, 250 Kuo Kuang Road, Taichung 402, Taiwan, R.O.C. Phone: +886–4–22857211 Fax: +886–4–22857211 E-mail:;

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• 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);
• 原文格式 PDF
• 正文语种 eng
• 中图分类
• 关键词

• 入库时间 2022-08-18 00:49:02