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首页> 外文期刊>Journal of Applied Physics >Inhomogeneity in the Magnitude of the Anisotropy Field in Thin Nickel‐Iron Films
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Inhomogeneity in the Magnitude of the Anisotropy Field in Thin Nickel‐Iron Films

机译:镍铁薄膜中各向异性场大小的不均匀性

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摘要

The inhomogeneity in the magnitude of the anisotropy field of vacuum‐deposited nickel‐iron films has been measured as a function of film composition, inhomogeneity in composition, substrate temperature, time interval of deposition, and diameter of the film. The part of the inhomogeneity in the magnitude of Hk due to the product of the magnetostriction and the nonisotropic strain is found to be twice the part of the inhomogeneity in the direction of Hk due to this cause, as predicted by Crowther. Part of the inhomogeneity in magnitude but not in direction of Hk is attributed to nonuniformity in substrate temperature, and part to magnetocrystalline anisotropy.
机译:测量了真空沉积镍铁膜的各向异性场大小的不均匀性,它是膜组成,组成不均匀性,基材温度,沉积时间间隔和膜直径的函数。正如克劳瑟所预言的,由于磁致伸缩和非各向同性应变的产物,Hk量级的不均匀性部分是Hk方向上不均匀性的两倍。数量级的不均匀性而不是Hk方向的不均匀性部分归因于衬底温度的不均匀性,而部分归因于磁晶各向异性。

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  • 来源
    《Journal of Applied Physics 》 |1964年第3期| 共2页
  • 作者

    Oredson H. N.; Torok E. J.;

  • 作者单位

    UNIVAC, Division of Sperry Rand Corporation, St. Paul, Minnesota;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
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