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Variation of secondary ion emission yield with atomic concentrations of Fe, Ni, and Cr ternary alloys and oxides: Application to the analysis of thin oxide films

机译:二次离子发射产率随Fe,Ni和Cr三元合金和氧化物的原子浓度而变化:在氧化薄膜分析中的应用

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摘要

For binary and ternary alloys of Fe, Ni, and Cr covered with oxygen and for solid oxides of these elements, the emission yield of monoatomic ions, Fe+, Ni+, and Cr+, are linear functions of the atomic concentrations CFe, CNi, and CCr . This empirical law suggest that the emission of M+ ions obeys a binary process, involving dynamic electronic exchanges between the M sputtered atoms and their neighbors during inelastic collisions. The determined formula for the interrelationship between the M+ intensities and the atomic concentrations is applied to the quantitative analysis of oxide films developed at high temperature on a refractory alloy.
机译:对于被氧覆盖的Fe,Ni和Cr的二元和三元合金以及这些元素的固体氧化物,单原子离子Fe +,Ni +和Cr +的发射率是原子浓度CFe,CNi和CCr的线性函数。该经验定律表明,M +离子的发射遵循二元过程,涉及在非弹性碰撞过程中M溅射原子与其相邻原子之间的动态电子交换。所确定的M +强度与原子浓度之间的相互关系的公式可用于高温分析在耐火合金上形成的氧化膜的定量分析。

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    《Journal of Applied Physics》 |1980年第8期|P.4158-4163|共6页
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  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
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