...
首页> 外文期刊>Journal of Applied Physics >A new approach to investigate leakage current mechanisms in infrared photodiodes from illuminated current-voltage characteristics
【24h】

A new approach to investigate leakage current mechanisms in infrared photodiodes from illuminated current-voltage characteristics

机译:从照明电流-电压特性研究红外光电二极管泄漏电流机理的新方法

获取原文
获取原文并翻译 | 示例

摘要

This paper presents a new approach to investigate leakage current mechanisms in infrared photodiodes from the illuminated current–voltage characteristics. The example of mid-wave mercury cadmium telluride photodiodes is presented to illustrate the new approach. The new method is suitable for evaluating diodes in an array environment as advance knowledge of any of the material or device parameters are not required. The thermal saturation current is estimated from the observed open circuit voltage and zero-bias current (photo-current) of the diode. The ohmic shunt resistance is estimated from the observed maximum dynamic impedance of the diode. The experimentally observed reverse bias diode current in excess of thermal current, photo-current, and ohmic shunt current is reported to be best described by an exponential function of the type, Iexcess = Ir0 + K1 exp (K2 V), where Ir0, K1, and K2 are fitting parameters and V is the applied bias voltage. Our investigations reveal a close link between the excess current and the sources of ohmic currents in the diode. Exponential growth of excess current with the applied bias voltage has been interpreted as an indication of soft breakdown of the diodes.
机译:本文提出了一种从照度电流-电压特性研究红外光电二极管泄漏电流机理的新方法。以中波汞碲化镉镉光电二极管为例,说明了该新方法。该新方法适用于评估阵列环境中的二极管,因为不需要任何材料或器件参数的先验知识。根据观察到的开路电压和二极管的零偏置电流(光电流)估算热饱和电流。欧姆分流电阻由观察到的二极管最大动态阻抗估算得出。据报道,实验观察到的反向偏置二极管电流超过热电流,光电流和欧姆分流电流,最好用以下类型的指数函数来描述:I excess = I r0 + K 1 exp(K 2 V),其中I r0 ,K 1 和K 2 是拟合参数,V是施加的偏置电压。我们的研究表明,过量电流与二极管中的欧姆电流源之间存在密切联系。多余电流随施加的偏置电压呈指数增长,被认为是二极管软击穿的指示。

著录项

  • 来源
    《Journal of Applied Physics 》 |2014年第8期| 1-6| 共6页
  • 作者

    Gopal Vishnu;

  • 作者单位

    Institute of Defence Scientists and Technologists, CFEES Complex, Brig. S. K. Majumdar Marg, Delhi 110054, India;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号