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Variation of the Axial Aberrations of Electron Lenses with Lens Strength

机译:电子透镜轴向像差随透镜强度的变化

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摘要

The variation of refractive power and spherical aberration with electrode voltages and field strengths is studied for two characteristic unipotential lenses, an immersion lens, and a magnetic lens. Conclusions are drawn herefrom regarding the variation, with lens strength and applied voltage, of the resolving power obtainable with the lens as an electron‐microscope objective. Scattered measurements by other authors agree satisfactorily with the results. The ``relativistic aberration'' of the electrostatic unipotential lenses, i.e., the effect on the image of fluctuations in the over‐all applied voltage, is calculated and shown to be of significance in the electrostatic electron microscope. Furthermore, the axial chromatic aberrations are computed for the four systems and the question of upper limits of the last two aberrations is discussed.
机译:研究了两种特性单电位透镜,浸没透镜和磁性透镜的折光力和球差随电极电压和场强的变化。由此得出的结论是,作为电子显微镜物镜的镜头可获得的分辨力随镜头强度和施加电压的变化而变化。其他作者的分散测量结果令人满意。计算得出静电单电势透镜的``相对论像差'',即对整体施加电压波动图像的影响,并在静电电子显微镜中显示出重要意义。此外,计算了四个系统的轴向色差,并讨论了最后两个像差的上限问题。

著录项

  • 来源
    《Journal of Applied Physics》 |1942年第9期|共13页
  • 作者

    Ramberg E. G.;

  • 作者单位

    Research Laboratories, RCA Manufacturing Company, Inc., Camden, New Jersey;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

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