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Visible and infrared emissions from c-axis oriented AlN:Er films grown by magnetron sputtering

机译:磁控溅射生长的c轴取向AlN:Er薄膜的可见光和红外光发射

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摘要

Visible and infrared photoluminescence was observed from AlN:Er films grown by reactive radio-frequency magnetron sputtering under different powers. X-ray diffraction indicates that the films have a c-axis oriented hexagonal wurtzite structure with an average crystallite size of about 59-83 nm and a strain of about (1.12-1.69) X 10~(-3). Green emissions (~540 and 558 nm) from the AlN:Er films are due to the intra-4f~n transition of Er~(3+) from ~2H_(11/2) and ~4S_(3/2) to ~4I_(15/2), and infrared (~1535 nm) emissions correspond to ~4I_(13/2) to ~4I_(15/2) transitions. Increasing the sputtering power results in larger grain size, lower strain, and enhancement of the luminescence intensity.
机译:通过反应射频磁控溅射在不同功率下生长的AlN:Er薄膜观察到可见和红外光致发光。 X射线衍射表明该膜具有c轴取向的六方纤锌矿结构,其平均微晶尺寸为约59-83nm,应变为(1.12-1.69)×10-(-3)。 AlN:Er薄膜的绿色发射(〜540和558 nm)是由于Er〜(3+)从〜2H_(11/2)和〜4S_(3/2)到〜的4f〜n跃迁所致。 4I_(15/2)和红外(〜1535 nm)发射对应于〜4I_(13/2)到〜4I_(15/2)跃迁。溅射功率的增加导致更大的晶粒尺寸,更低的应变以及发光强度的增强。

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