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Optical properties of SrTiO_3 thin films deposited by radio-frequency magnetron sputtering at various substrate temperatures

机译:射频磁控溅射在不同衬底温度下沉积的SrTiO_3薄膜的光学性质

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摘要

SrTiO_3 thin films were deposited on vitreous silica substrates at various substrate temperatures (300-700℃) by rf magnetron sputtering technique. The transition from amorphous phase to polycrystalline phase for the films occurred at the substrate temperatures of 300-400℃. Their optical properties were investigated by transmittance measurements. The fitting method was used to calculate the refractive index and the film thickness from the transparent region of the transmittance spectra. The refractive index increased and the film thickness decreased with the substrate temperatures increasing. The dispersion of the refractive index was studied by considering a single electronic oscillator model. The band gaps of the films were estimated from Tauc's law and showed a decreasing tendency to that of the bulk SrTiO_3 with the substrate temperatures increasing. These results provide some useful references for the potential application of SrTiO_3 films in integrated optics devices.
机译:通过射频磁控溅射技术,在不同衬底温度(300-700℃)下,将SrTiO_3薄膜沉积在石英玻璃衬底上。薄膜的非晶态向多晶态的转变发生在基板温度为300-400℃的条件下。通过透射率测量研究了它们的光学性质。使用拟合方法从透射光谱的透明区域计算折射率和膜厚度。随着基底温度的升高,折射率增加,膜厚度减小。通过考虑单个电子振荡器模型研究了折射率的色散。薄膜的带隙是根据Tauc定律估算的,并且随着基体温度的升高,其带隙比本体SrTiO_3的带隙有所减小。这些结果为SrTiO_3薄膜在集成光学器件中的潜在应用提供了一些有用的参考。

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