Influence of reactive atmosphere on properties of cobalt ferrite thin films prepared using pulsed-laser deposition

摘要

A series of cobalt ferrite (CFO) thin films were grown on SiO-2/Si(100) substrates using pulsedlaser deposition (PLD) at substrate temperature (T-DEP) of 250 ℃ and oxygen pressures (P-O2) from 0.67 to 6.7 Pa. The influence of P-O2 on crystal structure, phase mixture, deposition rate, and magnetic properties was investigated. It is shown in this study that there is a window of P-O2 for optimized growth of nanograined CFO films at low T-DEP and that either higher or lower values of P-O2 produce undesirable multiphase mixtures. CFO films grown at such low substrate temperature and optimized oxygen pressure on thermal expansion matched substrates can be applied in multilayer sensors or MEMS devices.