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Investigation of C_(60)F_(36) as low-volatility p-dopant in organic optoelectronic devices

机译:C_(60)F_(36)作为有机光电器件中低挥发性p型掺杂剂的研究

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摘要

We demonstrate highly efficient small molecule organic light emitting diodes and organic solar cells based on the p-i-n-type structure using the fluorinated fullerene molecule C_(60)F_(36) as p-dopant in the hole transport layer. We present synthesis, chemical analysis, and energy level investigation of the dopant as well as the conductivity of organic layers consisting of a matrix of N,N,N',N'-tetrakis 4-methoxyphenyl-benzidine(MeO-TPD) or N,N'-[(Diphenyl-N,N'-bis)9, 9,-dimethyl-fluoren-2-yl]-benzidine(BF-DPB) doped by the fullerene compound. State of the art organic p-i-n devices containing C_(60)F_(36) show efficiencies comparable to devices with the commonly used p-dopant2,3,5,6-tetrafluoro-7,7,8,8-tetracyanoquinodimethane (F_4-TCNQ). The advantages of the fullerene based dopant are the low volatility and high thermal stability, which is beneficial for device operation under elevated temperature. These properties make C_(60)F_(36) highly attractive for the usage as p-dopant in a broad spectrum of organic p-i-n devices like organic light emitting diodes, solar cells, memories, or transistors.
机译:我们在空穴传输层中使用氟化富勒烯分子C_(60)F_(36)作为p掺杂剂,展示了基于p-i-n型结构的高效小分子有机发光二极管和有机太阳能电池。我们介绍了掺杂剂的合成,化学分析和能级研究,以及由N,N,N',N'-四(4-甲氧基苯基)联苯胺(MeO-TPD)或N组成的有机层的电导率富勒烯化合物掺杂的,N′-[((二苯基-N,N′-bis)9,9,-二甲基-氟-2-基]联苯胺(BF-DPB)。包含C_(60)F_(36)的先进有机引脚设备显示出的效率可与常用p-dopant2,3,5,6-四氟-7,7,8,8-四氰基喹二甲烷(F_4-TCNQ )。富勒烯基掺杂剂的优点是低挥发性和高热稳定性,这对于在高温下的器件操作是有益的。这些特性使得C_(60)F_(36)对于在有机有机发光二极管,太阳能电池,存储器或晶体管等各种有机p-i-n器件中用作p型掺杂剂极具吸引力。

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  • 来源
    《Journal of Applied Physics》 |2011年第10期|p.139-144|共6页
  • 作者单位

    Institut für Angewandte Photophysik, Technische Universität Dresden, George-Bähr-StrAβe 1,01062 Dresden, Germany;

    Institut für Angewandte Photophysik, Technische Universität Dresden, George-Bähr-StrAβe 1,01062 Dresden, Germany;

    Institut für Angewandte Photophysik, Technische Universität Dresden, George-Bähr-StrAβe 1,01062 Dresden, Germany;

    Institut für Angewandte Photophysik, Technische Universität Dresden, George-Bähr-StrAβe 1,01062 Dresden, Germany;

    Institut für Angewandte Photophysik, Technische Universität Dresden, George-Bähr-StrAβe 1,01062 Dresden, Germany;

    Electrical Engineering Department, Nanoelectronic Center, Technion, Haifa 32000, Israel;

    Electrical Engineering Department, Nanoelectronic Center, Technion, Haifa 32000, Israel;

    Institut für Angewandte Photophysik, Technische Universität Dresden, George-Bähr-StrAβe 1,01062 Dresden, Germany;

    Institut für Angewandte Photophysik, Technische Universität Dresden, George-Bähr-StrAβe 1,01062 Dresden, Germany;

    Institut für Angewandte Photophysik, Technische Universität Dresden, George-Bähr-StrAβe 1,01062 Dresden, Germany;

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