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Electrical properties of in-plane-implanted graphite nanoribbons

机译:平面植入石墨纳米带的电学性质

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摘要

We studied the effect of low energy (30 keV) ionic implantation of Ga~+ in the direction parallel to the graphene planes (perpendicular to the c-axis) in oriented graphite ribbons with widths around 500 nm. Our experiments have reproducibly shown a reduction of electrical resistance upon implantation consistent with the occurrence of ionic channeling in our devices. Our results allow for new approaches in the modulation of the charge carrier concentration in mesoscopic graphite.
机译:我们研究了在宽度约500 nm的定向石墨带中,以平行于石墨烯平面(垂直于c轴)的方向对Ga〜+进行低能(30 keV)离子注入的影响。我们的实验可再现地显示出植入时电阻的降低与我们设备中离子通道的出现一致。我们的研究结果为介观石墨中载流子浓度的调节提供了新方法。

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  • 来源
    《Journal of Applied Physics》 |2017年第24期|244302.1-244302.5|共5页
  • 作者单位

    Institute of Physics, Polish Academy of Sciences, Aleja Lotnikow 32/46, PL-02-668 Warsaw, Poland,Division of Superconductivity and Magnetism, Felix Bloch Institute for Solid State Physics, Universitat Leipzig, Linnestrasse 5, D-04I03 Leipzig, Germany;

    Instituto Federal do Rio Grande do Sul, Campus Vacaria, 95200-000 Vacaria, RS, Brazil;

    Division of Superconductivity and Magnetism, Felix Bloch Institute for Solid State Physics, Universitat Leipzig, Linnestrasse 5, D-04I03 Leipzig, Germany;

    Division of Superconductivity and Magnetism, Felix Bloch Institute for Solid State Physics, Universitat Leipzig, Linnestrasse 5, D-04I03 Leipzig, Germany;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
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  • 正文语种 eng
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