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首页> 外文期刊>Journal of Applied Physics >Growth and characterization of MnGa thin films with perpendicular magnetic anisotropy on BiSb topological insulator
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Growth and characterization of MnGa thin films with perpendicular magnetic anisotropy on BiSb topological insulator

机译:BiSb拓扑绝缘体上具有垂直磁各向异性的MnGa薄膜的生长和表征

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摘要

We report on the crystal growth as well as the structural and magnetic properties of Bi_(0.8)Sb_(0.2) topological insulator (TI)/Mn_xGa_(1-) _x bi-layers grown on GaAs(111)A substrates by molecular beam epitaxy. By optimizing the growth conditions and Mn composition, we were able to grow Mn_xGa_(1-) _x thin films on Bi_(0.8)Sb_(0.2) with the crystallographic orientation of Bi_(0.8)Sb_(0.2)(001)[110]//MnGa (001)[100]. Using magnetic circular dichroism (MCD) spectroscopy, we detected both the L1_0 phase (x < 0.6) and the D0_(22) phase (x > 0.6) of Mn_xGa_(1-) _x. For 0.50 ≤ x ≤ 0.55, we obtained ferromagnetic L1_0-MnGa thin films with clear perpendicular magnetic anisotropy, which were confirmed by MCD hysteresis, anomalous Hall effect as well as superconducting quantum interference device measurements. Our results show that the BiSb/Mn_xGa_(1-) _x bi-layer system is promising for perpendicular magnetization switching using the giant spin Hall effect in TIs.
机译:我们报告通过分子束外延生长在GaAs(111)A衬底上的Bi_(0.8)Sb_(0.2)拓扑绝缘体(TI)/ Mn_xGa_(1-)_x双层晶体的生长以及结构和磁性。通过优化生长条件和Mn组成,我们能够在Bi_(0.8)Sb_(0.2)(001)的晶体取向上在Bi_(0.8)Sb_(0.2)上生长Mn_xGa_(1-)_x薄膜。[110] // MnGa(001)[100]。使用磁圆二色性(MCD)光谱,我们检测到Mn_xGa_(1-)_x的L1_0相(x <0.6)和D0_(22)相(x> 0.6)。对于0.50≤x≤0.55,我们获得了具有清晰垂直磁各向异性的铁磁L1_0-MnGa薄膜,该薄膜已通过MCD磁滞,异常霍尔效应以及超导量子干涉器件的测量得到了证实。我们的结果表明,BiSb / Mn_xGa_(1-)_x双层系统有望在TI中利用巨大的自旋霍尔效应进行垂直磁化开关。

著录项

  • 来源
    《Journal of Applied Physics》 |2017年第14期|143903.1-143903.6|共6页
  • 作者单位

    Department of Electrical and Electronic Engineering, Tokyo Institute of Technology, 2-12-1 Ookayama, Meguro, Tokyo, Japan;

    Department of Electrical and Electronic Engineering, Tokyo Institute of Technology, 2-12-1 Ookayama, Meguro, Tokyo, Japan;

    Department of Electrical and Electronic Engineering, Tokyo Institute of Technology, 2-12-1 Ookayama, Meguro, Tokyo, Japan;

    Department of Electrical and Electronic Engineering, Tokyo Institute of Technology, 2-12-1 Ookayama, Meguro, Tokyo, Japan;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
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