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Electron Diffraction Study of the Structures of Antimony Electrodeposited on Antimony Cleavage Face

机译:沉积在锑解理面上的锑结构的电子衍射研究

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摘要

Thin layers of antimony of average thickness about one hundred angstroms, electrodeposited at 90°C and 2 ma/cm2 on the (111) cleavage face (referred to pseudo‐cubic axes) of an antimony single crystal, yield abnormal electron diffraction patterns. Analysis of these patterns shows that the deposit crystals are arranged in three azimuthal equivalent orientations, with their (111¯) instead of the (111) lattice planes parallel to the (111) antimony substrate. This is confirmed by comparing the patterns obtained experimentally with those constructed from the Laue zones of reinforcement of the electron beam scattered from three nonparallel atom rows. This observation is discussed in connection with the various factors controlling the crystal orientation in electrodeposited metals.
机译:在90°C和2 ma / cm2的电沉积下,锑单晶的(111)劈裂面(称为伪立方轴)上平均厚度约为100埃的锑薄层产生异常的电子衍射图。对这些图案的分析表明,沉积晶体以三个方位等效方向排列,它们的(111’)代替了(111)晶面平行于(111)锑衬底。通过将实验获得的图形与从劳厄增强区构造的图形进行比较,可以证实该图形是从三个不平行的原子行散射的电子束的增强。结合控制电沉积金属中晶体取向的各种因素讨论了这一观察结果。

著录项

  • 来源
    《Journal of Applied Physics 》 |1954年第2期| 共5页
  • 作者

    Yang Ling;

  • 作者单位

    Metals Research Laboratory, Carnegie Institute of Technology, Pittsburgh, Pennsylvania;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
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