Optimization of the Kinematics Available in the Polishing Process of Ceramic Tiles by Computational Simulations

摘要

This work investigated the influence of the kinematics involved in the polishing process of stoneware tiles over the spatial distribution of abrasive contacts. The basic intention was to delimit the best combinations of both forward and transverse oscillation motions that would result in a uniform polishing effect over the tile surface. Such uniformity was quantitatively represented by the variance of the distribution of polishing time. By'means of computational algorithms, a wide range of both forward speed and oscillation frequency were simulated in order to obtain the corresponding distributions of polishing time. The results highlight the importance of adopting good kinematics to avoid excessive polishing gradients. Thus, a large number of kinematic conditions could be potentially recommended, whereas many others were found to be primarily inadequate. In view of this, the simulations carried out herein can be suggested as a useful guide for future phenomenological investigations, and also as a useful tool for polishing industries.