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首页> 外文期刊>Japanese journal of applied physics >Electrical characterization of graphene source/drain electrodes in amorphous indium-gallium-zinc-oxide thin-film transistors subjected to plasma treatment in contact regions
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Electrical characterization of graphene source/drain electrodes in amorphous indium-gallium-zinc-oxide thin-film transistors subjected to plasma treatment in contact regions

机译:在接触区域中对等离子体处理的非晶铟 - 镓 - 氧化锌薄膜晶体管中石墨烯源/漏电极的电学特性

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摘要

In this paper, the electrical characteristics of a-IGZO TFTs with graphene source/drain (S/D) electrodes subjected to argon plasma treatment are analyzed. Depending on the channel length (L), the a-IGZO TFTs showed parasitic resistance dominant (L 30 mu m) and channel conduction dominant regions (L = 30 mu m). Using the transmission line method, the intrinsic parameters were extracted. The intrinsic field-effect mobility was about 9.79 cm(2) s(-1) and the width-normalized parasitic resistance value was about 460 Omega.cm, which are comparable with those of a-IGZO TFTs having S/D plasma-treated regions with no contact metal. Temperature-dependent measurement indicates that the graphene electrodes affected the thermally deactivated behavior of the a-IGZO TFTs, which is different from the case of a-IGZO TFTs having conventional metal electrodes. (C) 2019 The Japan Society of Applied Physics
机译:本文分析了对经过氩等离子质处理的石墨烯源/漏极(S / D)电极的A-IgZo TFT的电特性。取决于通道长度(L),A-IgZO TFT显示寄生电阻优势(L <30μm)和通道传导优势区(L> =30μm)。使用传输线方法,提取内在参数。内在场效应迁移率约为9.79cm(2)s(-1),宽度归一化寄生电阻值约为460ωcm,其与具有S / D等离子体处理的A-IgZo TFT的达ωcm相当没有接触金属的区域。温度依赖性测量表明石墨烯电极影响A-IGZO TFT的热失活行为,其与具有常规金属电极的A-IGZO TFT的情况不同。 (c)2019年日本应用物理学会

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  • 来源
    《Japanese journal of applied physics》 |2019年第7期|071003.1-071003.6|共6页
  • 作者

    Jeong Jaewook; Kim Joonwoo;

  • 作者单位

    Chungbuk Natl Univ Sch Informat & Commun Engn Cheongju 28644 Chungbuk South Korea;

    Daegu Gyeongbuk Inst Sci & Technol Intelligent Devices & Syst Res Grp Daegu South Korea;

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  • 正文语种 eng
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