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Barrier Thickness Dependence of Photovoltaic Characteristics of InGaN/GaN Multiple Quantum Well Solar Cells

机译:InGaN / GaN多量子阱太阳能电池光伏特性的壁垒厚度依赖性

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摘要

We discuss the influence of the barrier thickness of an InGaN/GaN multiple quantum well (MQW) structure on solar cell performance. As barrier thickness decreases, short-circuit current density increases and open-circuit voltage decreases. The open-circuit voltage is much lower than expected from the absorption edge because of the large leakage current and large ideality factor of diodes owning to the carrier tunneling through the barrier. An MQW with a 3-nm-thick barrier layer shows a much longer carrier lifetime than that with a 9-nm-thick barrier layer. This is one possible reason for a higher short-circuit current in solar cell with the 3-nm-thick barrier MQW structure than that with the 9-nm-thick barrier MQW.
机译:我们讨论了InGaN / GaN多量子阱(MQW)结构的势垒厚度对太阳能电池性能的影响。随着势垒厚度的减小,短路电流密度增加,开路电压减小。由于载流子穿过势垒隧穿的二极管具有大的泄漏电流和大的理想因子,因此开路电压远低于吸收边缘的预期值。厚度为3纳米的阻挡层的MQW的载流子寿命比厚度为9纳米的阻挡层的载流子寿命长得多。这是厚度为3纳米的势垒MQW结构的太阳能电池的短路电流高于厚度为9纳米的势垒MQW的太阳能电池短路电流的可能原因之一。

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  • 来源
    《Japanese journal of applied physics》 |2012年第10issue2期|10ND10.1-10ND10.5|共5页
  • 作者单位

    NTT Photonics Laboratories, Nippon Telegraph and Telephone Corporation, Atsugi, Kanagawa 243-0198, Japan;

    NTT Photonics Laboratories, Nippon Telegraph and Telephone Corporation, Atsugi, Kanagawa 243-0198, Japan;

    NTT Photonics Laboratories, Nippon Telegraph and Telephone Corporation, Atsugi, Kanagawa 243-0198, Japan,Graduate School of Engineering, Osaka City University, Osaka 558-8585, Japan;

    Graduate School of Engineering, University of Fukui, Fukui 910-8507, Japan;

    Graduate School of Engineering, University of Fukui, Fukui 910-8507, Japan;

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