机译:饱和区鳍式场效应晶体管的1 / f噪声特性
Department of Electronics and Electrical Engineering, Keio University, Yokohama 223-8522, Japan;
National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba, Ibaraki 305-8568, Japan;
National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba, Ibaraki 305-8568, Japan;
National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba, Ibaraki 305-8568, Japan;
National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba, Ibaraki 305-8568, Japan;
National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba, Ibaraki 305-8568, Japan;
National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba, Ibaraki 305-8568, Japan;
National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba, Ibaraki 305-8568, Japan;
National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba, Ibaraki 305-8568, Japan;
National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba, Ibaraki 305-8568, Japan;
National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba, Ibaraki 305-8568, Japan;
Department of Electronics and Electrical Engineering, Keio University, Yokohama 223-8522, Japan;
机译:氮流量比与溅射氮化钛栅体平面金属氧化物半导体场效应晶体管和鳍型金属氧化物半导体场效应晶体管电学特性的比较研究
机译:结合传输特性和随机电报噪声测量,提取纳米线场效应晶体管中的场效应迁移率
机译:三维瓶颈屏障高度最小对硅 - 衬里三栅鳍片型场效应晶体管源极和排水延伸的离子植入阈值电压波动
机译:可以设计短通道石墨烯场效应晶体管的输出特性中的准饱和吗?
机译:场效应晶体管中的电流饱和机制。
机译:电流拥挤介导的石墨烯场效应晶体管中的大接触噪声
机译:结合传输特性和随机电报噪声测量,提取纳米线场效应晶体管中的场效应迁移率