首页> 外文期刊>Japanese journal of applied physics >1/f Noise Characteristics of Fin-Type Field-Effect Transistors in Saturation Region
【24h】

1/f Noise Characteristics of Fin-Type Field-Effect Transistors in Saturation Region

机译:饱和区鳍式场效应晶体管的1 / f噪声特性

获取原文
获取原文并翻译 | 示例
获取外文期刊封面目录资料

摘要

In this work, we measured 1/f noise of independent-double-gate- (IDG-) fin-type FET (FinFET) which has two independent gates. Flicker noise of common-double-gate- (CDG-) mode which both gates are applied with the same voltage and IDG-mode that has one gate voltage grounded and the other gate voltage applied with arbitrary voltage, and both result were compared with the same drain current (I_d). First, we measured relationship between characteristic of the normalized 1/f noise by I_d (S_(I_d)I_d~2) and characteristic of I_d. Both the I_d (S_(I_d)I_d~2) of IDG- and CDG-modes show nearly equal values and tendency. Next, this work also shows the relationship between 1/f noise and vertical electric field (E_⊥) of surface of gate oxide film. As a result we could not definitely see a large margin of 1/f noise between CDG- and IDG-modes from E_⊥. This work also discovered that 1/f noise was greatly influenced by I_d density.
机译:在这项工作中,我们测量了具有两个独立栅极的独立双栅极(IDG-)鳍式FET(FinFET)的1 / f噪声。将两个栅极都施加相同电压的通用双栅极(CDG-)模式的闪变噪声和将一个栅极电压接地并且将另一个栅极电压施加任意电压的IDG模式的闪变噪声与这两个结果进行了比较相同的漏极电流(I_d)。首先,我们测量了通过I_d(S_(I_d)I_d〜2)归一化的1 / f噪声的特性与I_d的特性之间的关系。 IDG模式和CDG模式的I_d(S_(I_d)I_d〜2)都显示几乎相等的值和趋势。接下来,该工作还示出了1 / f噪声与栅氧化膜的表面的垂直电场(E_⊥)之间的关系。结果,我们不能肯定地看到E_⊥的CDG模式和IDG模式之间存在较大的1 / f噪声余量。这项工作还发现1 / f噪声受I_d密度的很大影响。

著录项

  • 来源
    《Japanese journal of applied physics》 |2013年第4issue2期|04CC23.1-04CC23.5|共5页
  • 作者单位

    Department of Electronics and Electrical Engineering, Keio University, Yokohama 223-8522, Japan;

    National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba, Ibaraki 305-8568, Japan;

    National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba, Ibaraki 305-8568, Japan;

    National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba, Ibaraki 305-8568, Japan;

    National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba, Ibaraki 305-8568, Japan;

    National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba, Ibaraki 305-8568, Japan;

    National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba, Ibaraki 305-8568, Japan;

    National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba, Ibaraki 305-8568, Japan;

    National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba, Ibaraki 305-8568, Japan;

    National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba, Ibaraki 305-8568, Japan;

    National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba, Ibaraki 305-8568, Japan;

    Department of Electronics and Electrical Engineering, Keio University, Yokohama 223-8522, Japan;

  • 收录信息
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号