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首页> 外文期刊>Japanese journal of applied physics >Crystal direction dependence of quantum confinement effects of two-dimensional Si layers fabricated on silicon-on-quartz substrates: modulation of phonon spectra and energy band structures
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Crystal direction dependence of quantum confinement effects of two-dimensional Si layers fabricated on silicon-on-quartz substrates: modulation of phonon spectra and energy band structures

机译:石英硅衬底上制造的二维Si层的量子约束效应的晶体方向依赖性:声子谱和能带结构的调制

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摘要

We experimentally studied the crystal direction dependence of phonon confinement effects (PCEs) and bandgap (E_G) modulation of a two-dimensional (2D) Si layer fabricated on (100) silicon-on-quartz (SOQ) wafers without a handle Si substrate. For the first time, by polarization Raman spectroscopy, in the case of Raman intensity spectra in the asymmetrical broadening region owing to the PCEs in the 2D Si layer, we demonstrated that the incident laser polarization direction dependence of the Raman intensity deviates from the Raman selection rule. However, a photoluminescence (PL) method shows that the E_G expansion is isotropic in the 2D Si layer. On the other hand, the reflectivity of the 2D Si layer in UV region is also modulated. The reflectivity property modulation is possibly attributable to the energy band modulation in the 2D Si layer.
机译:我们实验研究了在没有手柄Si衬底的(100)石英硅(SOQ)晶片上制造的二维(2D)Si层的声子限制效应(PCE)和带隙(E_G)调制的晶体方向依赖性。首次通过偏振拉曼光谱,在二维硅层中由于PCE引起的非对称展宽区域中的拉曼强度光谱的情况下,我们证明了拉曼强度的入射激光偏振方向依赖性偏离了拉曼选择规则。但是,光致发光(PL)方法显示E_G扩展在2D Si层中是各向同性的。另一方面,2D Si层在UV区域中的反射率也被调制。反射特性调制可能归因于2D Si层中的能带调制。

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  • 来源
    《Japanese journal of applied physics》 |2014年第4s期|04EC09.1-04EC09.6|共6页
  • 作者单位

    Department of Science, Kanagawa University, Hiratsuka, Kanagawa 259-1293, Japan;

    Department of Science, Kanagawa University, Hiratsuka, Kanagawa 259-1293, Japan;

    Department of Science, Kanagawa University, Hiratsuka, Kanagawa 259-1293, Japan;

    Department of Science, Kanagawa University, Hiratsuka, Kanagawa 259-1293, Japan;

    Department of Science, Kanagawa University, Hiratsuka, Kanagawa 259-1293, Japan;

    Department of Science, Kanagawa University, Hiratsuka, Kanagawa 259-1293, Japan;

    Department of Science, Kanagawa University, Hiratsuka, Kanagawa 259-1293, Japan;

    Department of Engineering, Tokyo University of Agriculture and Technology, Koganei, Tokyo 184-8588, Japan;

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