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Enhancement of effective electromechanical coupling factor by mass loading in layered surface acoustic wave device structures

机译:分层声表面波器件结构中的质量载荷提高有效的机电耦合系数

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摘要

This paper describes a drastic enhancement of the effective coupling factor K-e(2) by mass loading in layered surface acoustic wave (SAW) device structures such as the ScAlN film/Si substrate structure. This phenomenon occurs when the piezoelectric layer exhibits a high acoustic wave velocity. The mass loading decreases the SAW velocity and causes SAW energy confinement close to the top surface where an interdigital transducer is placed. It is shown that this phenomenon is obvious even when an amorphous SiO2 film is deposited on the top surface for temperature compensation. This K-e(2) enhancement was also found in various combinations of electrode, piezoelectric layer, and/or substrate materials. The existence of this phenomenon was verified experimentally using the ScAlN film/Si substrate structure. (C) 2016 The Japan Society of Applied Physics
机译:本文描述了通过在层表面声波(SAW)器件结构(例如ScAlN膜/ Si衬底结构)中进行质量加载来有效增强有效耦合因子K-e(2)。当压电层表现出高声波速度时,会发生这种现象。质量负载降低了SAW速度,并导致SAW能量限制在靠近放置叉指式换能器的顶表面处。结果表明,即使在用于温度补偿的顶表面上沉积了非晶SiO 2膜,这种现象也很明显。在电极,压电层和/或衬底材料的各种组合中也发现了这种K-e(2)增强。使用ScAlN膜/ Si基板结构通过实验验证了此现象的存在。 (C)2016年日本应用物理学会

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  • 来源
    《Japanese journal of applied physics》 |2016年第7s1期|07KD07.1-07KD07.5|共5页
  • 作者单位

    Shanghai Jiao Tong Univ, Sch Elect Informat & Elect Engn, Shanghai 200240, Peoples R China|Chiba Univ, Grad Sch Engn, Chiba 2638522, Japan;

    Shanghai Jiao Tong Univ, Sch Elect Informat & Elect Engn, Shanghai 200240, Peoples R China;

    DENSO Corp, Res Labs, Nisshin, Aichi 4700111, Japan;

    DENSO Corp, Res Labs, Nisshin, Aichi 4700111, Japan;

    Shanghai Jiao Tong Univ, Sch Elect Informat & Elect Engn, Shanghai 200240, Peoples R China|Chiba Univ, Grad Sch Engn, Chiba 2638522, Japan;

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